A*STAR - Agency for Science, Technology and Research
Senior Research Engineer, Process Modules
Skills
1 month ago
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Important information
Contract type:
Permanent
Location:
Singapore
Work mode:
Onsite
Published on:
15 September 2026
What they need
Job Responsibilities
Engineer/Sr Research Engineer (Lithography process R&D in Advanced Process Modules) IME Job Description
- Actively working with cross functional stake owners to plan and develop new process.
- Validate design, reticle tap out and post tap out verification.
- Assist in internal and external technical discussion to overcome process related challenge and provide relevant solution.
- Perform process characterization, margin study to determine the process capability of new process platform.
- Act as a subject matter expert and resource for researchers and industry partners to enable process and/or product realization.
- Publish process development outcome and breakthrough in research community.
- Engage with relevant equipment makers/vendors and responsible for selecting and procuring research equipment.
- Work with fab team in establishing SPC for newly developed process.
Requirements
- Master/bachelor’s degree in Materials Science, Electrical Engineering, Chemical Engineering, Physics, Chemistry, and Microelectronics, or closely related fields are welcome to apply.
- More than 2 years relevant working experiences in R&D and/or industry environment with broad exposure in handling 6”, 8” and/or 12” substrate covering nano to micron tech nodes, preferably experiences in SiC/GaN/Photonics.
- Proficient in Photolithography tools including Immersion/KrF/I-line Scanner/Stepper/Mask Aligner, knowledge in EBEAM Lithography tool will be added advantage.
- Hand on experiences in metrology including but not limited to CDSEM, Overlay, OCD, DRSEM, Microscope. Capable to create recipe to support various research requirement.
- Knowledge in design and simulation (Prolith, OPC, etc), reticle layout (oas, gds) review and basic tap out process.
- Equip with Lithography skills set including fundamental Lithography theory, Photoresist characteristic and application, new process setup (swing curve, FEM, DOE, statistical root cause analysis and problem-solving methods, etc), optimization and margin improvement.
- Relevant hardware and application knowledge in Lithography tools and metrology.
- Possess good interpersonal and oral/written communication skills, with ability to deliver clear and concise messages to both internal and external stakeholders.
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